NTPF Etalon Ltd. has mastered the production of SHS-silicon nitride by the method of self-propogating high-temperature synthesis (SHS). The new material is produced in a special reactors at the pressure of ~10 MPa and the temperature of ~2000 °C. The offered technology allows to obtain a high quality product with a minimum concentration of oxygen. Unlike analog, produced in the furnaces, the principal phase of SHS-silicon nitride is a high-temperature "beta" modification (β-Si3N4). Such material has improved resistance to melts of non-ferrous metals and iron and is specially designed for refractory production. SHS-silicon nitride is manufactured of two grades: NK1 and NK2 (table).
Chemical composition of SHS-silicon nitride for refractory production
Grade | Mass fraction, % | |||||
---|---|---|---|---|---|---|
N | Al | Ca | Fe | O | Phase | |
min | max | |||||
NK1 | 36 | 0,5 | 0,4 | 0,7 | 1,1 | β-Si3N4 95 min |
NK2 | 35 | 1,0 | 0,7 | 1,2 | 1,2 | β-Si3N4 90 min |
Grain size 0–0,315 mm; other – by the customer require.
Other refractory materials